添加Ag中间层QAl10-5-5/TC6双金属界面金属间化合物的有序演化与界面强化机制
孙利星, 薛航宇, 梁淑华, 杨倩, 姜琪, 邹军涛

Ordering Process of Interfacial Intermetallic Compounds and Strengthening Mechanism of QAl10-5-5/TC6 Bimetals Adding Ag Interlayer
SUN Lixing, XUE Hangyu, LIANG Shuhua, YANG Qian, JIANG Qi, ZOU Juntao
图6 不同连接温度下电沉积Ag层QAl10-5-5合金/TC6合金双金属界面显微组织的SEM像和剪切强度
Fig.6 Interfacial SEM images at bonding temperature of 805 oC (a), 835 oC (b), and 850 oC (c, d), and shear strengths (e) of Ag layer deposited QAl10-5-5/TC6 bimetals