(AlCrTaTiZr)N x 阻氚涂层制备及其表面氢同位素吸附

张建东, 席晓翀, 凌永生, 曾繁荣, 单卿, 贾文宝

Preparation of (AlZrTaTiZr)N x Tritium Barrier Coating and Adsorption of Hydrogen Isotope on the Surface

ZHANG Jiandong, XI Xiaochong, LING Yongsheng, ZENG Fanrong, SHAN Qing, JIA Wenbao

表1 不同N2流量下氮化物薄膜的各元素含量EDS结果 (atomic fraction / %)

Table 1 Element contents in the nitride films at different N2 fluxes measured by EDS

RN / % Al Cr Ta Ti Zr N 0 16.00 20.32 17.64 24.88 20.36 0 5 7.86 11.46 9.27 11.38 13.51 46.52 10 5.25 10.59 9.13 8.14 10.61 56.28 15 4.45 10.01 9.00 6.70 10.86 58.98 20 3.45 9.30 8.78 6.16 9.66 62.65