(AlCrTaTiZr)N x 阻氚涂层制备及其表面氢同位素吸附
Preparation of (AlZrTaTiZr)N x Tritium Barrier Coating and Adsorption of Hydrogen Isotope on the Surface
(a) RN = 0 (b) RN = 5% (c) RN = 10% (d, f) RN = 15% (e) RN = 20%
(AlCrTaTiZr)N x 阻氚涂层制备及其表面氢同位素吸附 |
| 张建东, 席晓翀, 凌永生, 曾繁荣, 单卿, 贾文宝 |
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Preparation of (AlZrTaTiZr)N x Tritium Barrier Coating and Adsorption of Hydrogen Isotope on the Surface |
| ZHANG Jiandong, XI Xiaochong, LING Yongsheng, ZENG Fanrong, SHAN Qing, JIA Wenbao |
| 图6 不同N2流量(RN = 0~20%)下氮化物薄膜表面以及截面形貌SEM像 |
| Fig.6 Surfacial (a-e) and cross-sectional (f) SEM images of nitride films under different N2 flow rates (a) RN = 0 (b) RN = 5% (c) RN = 10% (d, f) RN = 15% (e) RN = 20% |
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