图8. 半共格异质界面失配位错序列设计[74,78] (a, b) the MDIs in Cu/Nb and Cu/V interfaces (The dashed lines indicate interface misfit dislocations)[74] (c) the black dots present the areal densities of MDIs calculated by O-lattice theory for a range of fcc/bcc pairs with different lattice parameter ratios, but identical interface crystallography (Kurdjumov-Sachs orientation relation and closest-packed interface planes); the red diamonds are critical He concentrations measured to detect He bubbles in TEM; and the dashed line is a visual guide[74] (d-i) plan-view images of He channels[78] (d-g) underfocused plan-view TEM micrographs (400-nm underfocus) of the V/Cu/V trilayer after He implantation to fluences of 1×1015 ions/cm2 (d), 3×1015 ions/cm2 (e), 5×1015 ions/cm2 (f), and 1×1016 ions/cm2 (g) (h, i) an isolated precipitate from a sample implanted to 31015 ions/cm2 appears bright in underfocus (h) and dark in overfocus (i) imaging conditions (400-nm overfocus), confirming that it is an elongated, He filled cavity
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