合金化元素对W-Cu体系多类界面特征影响的第一性原理计算
盖逸冰, 唐法威, 侯超, 吕皓, 宋晓艳(
)
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First-Principles Calculation on the Influence of Alloying Elements on Interfacial Features of W-Cu System
GAI Yibing, TANG Fawei, HOU Chao, LU Hao, SONG Xiaoyan()
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图8. W晶界中Sc元素在偏聚前后晶界区域的局部电荷密度及局部差分电荷密度分布
Fig.8. Distributions of local charge density (left) and local charge density difference (right) of Sc element in W grain boundary
(a) before Sc segregation (b) after Sc segregation
