合金化元素对W-Cu体系多类界面特征影响的第一性原理计算
盖逸冰, 唐法威, 侯超, 吕皓, 宋晓艳(
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First-Principles Calculation on the Influence of Alloying Elements on Interfacial Features of W-Cu System
GAI Yibing, TANG Fawei, HOU Chao, LU Hao, SONG Xiaoyan()
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图5. In元素在Cu的晶界面偏聚后、W/Cu相界面中W侧偏聚后、W/Cu相界面中Cu侧偏聚后的局部电荷密度图和差分电荷密度图
Fig.5. The local charge densities and local charge density differences of In element after segregation into Cu interface (a), W side of W/Cu interface (b) and Cu side of W/Cu interface (c)
