合金化元素对W-Cu体系多类界面特征影响的第一性原理计算
盖逸冰, 唐法威, 侯超, 吕皓, 宋晓艳(
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First-Principles Calculation on the Influence of Alloying Elements on Interfacial Features of W-Cu System
GAI Yibing, TANG Fawei, HOU Chao, LU Hao, SONG Xiaoyan()
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图2. W(111)/Cu(111)相界模型中W原子和Cu原子的局域态密度图、局部电荷密度分布和局部差分电荷密度分布
Fig.2. Local density of states (LDOSs) (a), local charge density (LCD) distribution (b) and local charge density difference (LCDD) distribution (c) of W and Cu atoms in the W(111)/Cu(111) interface model (E—energy)
