Ti-B-N纳米复合涂层的设计、制备及性能

刘艳梅, 王铁钢, 郭玉垚, 柯培玲, 蒙德强, 张纪福

Design, Preparation and Properties of Ti-B-N Nanocomposite Coatings

LIU Yanmei, WANG Tiegang, GUO Yuyao, KE Peiling, MENG Deqiang, ZHANG Jifu

表1 不同TiB2靶溅射功率制备Ti-B-N涂层的工艺参数

Table 1 Deposition parameters of the Ti-B-N coatings prepared by different sputtering powers of the TiB2 target

Parameter Value Unit Base pressure 3.0×10-3 Pa Working pressure 0.6 Pa Pulsed DC sputtering power (TiB2 target) 0.8, 1.2, 1.6, 2.0, 2.4 kW Bias voltage -50 V Ar∶N2 flow ratio 96∶4 Deposition temperature 300 ℃ Substrate rotation speed 30 r·min-1 Distance between target and substrate 80 mm Deposition time 360 min