外延膜的高分辨X射线衍射分析

李长记¹,邹敏杰^1,²,张磊¹(

),王元明¹(

),王甦程¹

High-Resolution X-Ray Diffraction Analysis of Epitaxial Films

LI Changji¹,ZOU Minjie^1,²,ZHANG Lei¹(

),WANG Yuanming¹(

),WANG Sucheng¹

图12. Si_1-_xGe_x/Si外延结构的(206)+和(206)-衍射强度与 $2 θ$ 关系曲线

Fig.12. Curves of intensity vs $2 θ$ for asymmetric (206)+ reflection and (206)- reflection from an inclined Si_1-_xGe_x/Si epitaxial structure and substrate shown in Fig.7