外延膜的高分辨X射线衍射分析

李长记¹,邹敏杰^1,²,张磊¹(

),王元明¹(

),王甦程¹

High-Resolution X-Ray Diffraction Analysis of Epitaxial Films

LI Changji¹,ZOU Minjie^1,²,ZHANG Lei¹(

),WANG Yuanming¹(

),WANG Sucheng¹

图10. Si_1-_xGe_x/Si外延结构的低角X射线强度与 $2 θ$ 关系曲线

Fig.10. Curve of intensity vs $2 θ$ of low angle X-ray reflectivity for the Si_1-_xGe_x/Si epitaxial structure (In the inset, layer is Si_1-_xGe_x, substrate is Si)