N掺杂对磁控溅射Ta涂层微观结构与耐磨损性能的影响
杨莎莎1,2,杨峰3,陈明辉4(
),牛云松1,朱圣龙1,王福会4
),牛云松1,朱圣龙1,王福会4
Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering
Shasha YANG1,2,Feng YANG3,Minghui CHEN4(),Yunsong NIU1,Shenglong ZHU1,Fuhui WANG4
),Yunsong NIU1,Shenglong ZHU1,Fuhui WANG4
图5. 不同Ar气以及N2流量下沉积的Ta涂层磨痕形貌的SEM像
Fig.5. Worn surface SEM images of Ta coatings deposited under different Ar and N2 fluxes(a) 10Ar (b) 10Ar-1N2 (c) 10Ar-5N2 (d) 15Ar (e) 15Ar-5N2
