N掺杂对磁控溅射Ta涂层微观结构与耐磨损性能的影响
杨莎莎1,2,杨峰3,陈明辉4(
),牛云松1,朱圣龙1,王福会4
),牛云松1,朱圣龙1,王福会4
Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering
Shasha YANG1,2,Feng YANG3,Minghui CHEN4(),Yunsong NIU1,Shenglong ZHU1,Fuhui WANG4
),Yunsong NIU1,Shenglong ZHU1,Fuhui WANG4
图1. 不同Ar气以及N2流量下沉积的Ta涂层表面及断面形貌的SEM像
Fig.1. Surface (a, c, e, g, i) and cross-sectional (b, d, f, h, j) SEM images of as-deposited Ta coatings with different Ar and N2 fluxes (Insets in Figs.1a, c, e, g and i show the enlarged views)(a, b) 10Ar (c, d) 10Ar-1N2 (e, f) 10Ar-5N2 (g, h) 15Ar (i, j) 15Ar-5N2
