N掺杂对磁控溅射Ta涂层微观结构与耐磨损性能的影响
杨莎莎1,2,杨峰3,陈明辉4(
),牛云松1,朱圣龙1,王福会4
),牛云松1,朱圣龙1,王福会4
Effect of Nitrogen Doping on Microstructure and Wear Resistance of Tantalum Coatings Deposited by Direct Current Magnetron Sputtering
Shasha YANG1,2,Feng YANG3,Minghui CHEN4(),Yunsong NIU1,Shenglong ZHU1,Fuhui WANG4
),Yunsong NIU1,Shenglong ZHU1,Fuhui WANG4
图7. 有无N元素掺杂时Ta涂层的磨损机理示意图
Fig.7. Schematics of wear mechanisms for Ta coatings (FN—vertical load, V—sliding velocity)(a) none N-doped Ta coating (b) N-doped Ta coating
