双脉冲HiPIMS放电特性及CrN薄膜高速率沉积
吴厚朴,田修波(
),张新宇,巩春志
),张新宇,巩春志
Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate
Houpu WU,Xiubo TIAN(),Xinyu ZHANG,Chunzhi GONG
),Xinyu ZHANG,Chunzhi GONG
图11. 双脉冲HiPIMS引燃脉冲电压及HiPIMS条件对CrN薄膜单位功率沉积速率的影响
Fig.11. Influence of ignition pulse voltage of dual-pulse HiPIMS and conventional HiPIMS on the deposition rate at unit power
