双脉冲HiPIMS放电特性及CrN薄膜高速率沉积
吴厚朴,田修波(
),张新宇,巩春志
),张新宇,巩春志
Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate
Houpu WU,Xiubo TIAN(),Xinyu ZHANG,Chunzhi GONG
),Xinyu ZHANG,Chunzhi GONG
图8. 双脉冲HiPIMS不同引燃脉冲电压及HiPIMS条件下CrN薄膜表面与截面形貌的SEM像
Fig.8. Surface (a, c, e, g, i) and cross-sectional (b, d, f, h, j) SEM images of CrN coatings deposited by conventional HiPIMS (a, b) and dual-pulse HiPIMS with ignition pulse voltages of 530 V (c, d), 560 V (e, f), 590 V (g, h) and 620 V (i, j)
