双脉冲HiPIMS放电特性及CrN薄膜高速率沉积
吴厚朴,田修波(
),张新宇,巩春志
),张新宇,巩春志
Discharge Characteristics of Novel Dual-Pulse HiPIMS and Deposition of CrN Films with High Deposition Rate
Houpu WU,Xiubo TIAN(),Xinyu ZHANG,Chunzhi GONG
),Xinyu ZHANG,Chunzhi GONG
图1. 双脉冲高功率脉冲磁控溅射(HiPIMS)沉积系统示意图
Fig.1. Schematic of the dual-pulse high power impulse magnetron sputtering (HiPIMS) deposition system
