溅射沉积Mg2(Sn, Si)薄膜组织结构与导电性能
宋贵宏1(
),李贵鹏1,刘倩男1,杜昊2(),胡方1
),李贵鹏1,刘倩男1,杜昊2(),胡方1
Microstructure and Electric Conductance of Mg2(Sn, Si) Thin Films by Sputtering
SONG Guihong1(),LI Guipeng1,LIU Qiannan1,DU Hao2(),HU Fang1
),LI Guipeng1,LIU Qiannan1,DU Hao2(),HU Fang1
图2. 不同Mg靶溅射时间沉积薄膜的表面形貌。
Fig.2. Surface morphologis of the deposited films with different sputtering time of Mg target(a) S1 (b) S2 (c) S3 (d) S4 (e) S5 (f) S6
