Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响
何贤美1,童六牛2(
),高成2,王毅超2
),高成2,王毅超2
Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering
HE Xianmei1,TONG Liuniu2(),GAO Cheng2,WANG Yichao2
),GAO Cheng2,WANG Yichao2
图11. 室温下测定的退火态Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm)薄膜的Hc-in随x的变化关系
Fig.11. The x dependence of Hc-in of the annealed Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm) films with x=2.5, 3.8, 4.4, 5.2, 6.1 and 7.2, respectively
