Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响
何贤美1,童六牛2(
),高成2,王毅超2
),高成2,王毅超2
Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering
HE Xianmei1,TONG Liuniu2(),GAO Cheng2,WANG Yichao2
),GAO Cheng2,WANG Yichao2
图9. 在600 ℃快速退火30 min后Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm)薄膜的XRD谱
Fig.9. XRD spectra of the annealed Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm) films with x=2.5~7.2. The films were annealed at 600 ℃ for 30 min in a RTA system
