Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响
何贤美1,童六牛2(
),高成2,王毅超2
),高成2,王毅超2
Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering
HE Xianmei1,TONG Liuniu2(),GAO Cheng2,WANG Yichao2
),GAO Cheng2,WANG Yichao2
图7. 制备态Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm) 薄膜中Co和Nd元素的二维成分分布图
Fig.7. Typical two-dimensional elemental maps of Co (a, c) and Nd (b, d) in the as-deposited Si(111)/Cr(10 nm)/NdCox (400 nm)/Cr(10 nm) alloy films with x=2.5 (a, b) and 5.2 (c, d), respectively (Areas of SEM-EDS images are 40 μm×40 μm)
