Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响
何贤美1,童六牛2(
),高成2,王毅超2
),高成2,王毅超2
Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering
HE Xianmei1,TONG Liuniu2(),GAO Cheng2,WANG Yichao2
),GAO Cheng2,WANG Yichao2
图6. 制备态Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm)薄膜的MFM和AFM像
Fig.6. MFM (a, b) and AFM topographic (c, d) images for the as-deposited Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm) films with x=2.5 (a, c) and 5.2 (b, d), respectively
