Nd含量对磁控溅射Si(111)/Cr/Nd-Co/Cr薄膜结构与磁性的影响
何贤美1,童六牛2(
),高成2,王毅超2
),高成2,王毅超2
Effect of Nd Content on the Structure and Magnetic Properties of Si(111)/Cr/Nd-Co/Cr Thin Films Prepared by Magnetron Sputtering
HE Xianmei1,TONG Liuniu2(),GAO Cheng2,WANG Yichao2
),GAO Cheng2,WANG Yichao2
图2. 制备态Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm)薄膜的面内与法向磁滞回线
Fig.2. Hysteresis loops with the magnetic field applied perpendicular and parallel to the plane of the thin films at room temperature for the as-deposited Si(111)/Cr(10 nm)/NdCox(400 nm)/Cr(10 nm) thin films with x=2.5 (a), 3.8 (b), 5.2 (c), 7.2 (d), respectively (M—magnetization, Ms—saturation magnetization, H—intensity of the applied magnetic field)
