基于磁控溅射法显微CT W-Al透射靶材的制备及其性能研究*
|
RESEARCH ON THE PREPARATION AND PERFOR-MANCE OF TUNGSTEN-ALUMINUM TRANSMIS-SION TARGET FOR MICRO-COMPUTED TOMOGRAPHY BY MAGNETRONSPUTTERING
|
图5. 不同模式不同管电流下YXLON原机和5 μm厚度W-Al透射靶出射的X射线强度及其所需功率 |
Fig.5. X-ray emitting efficiency (a, c, e) and its production power dependence (b, d, f) of W-Al transmission target of YXLON and W-Al transmission target with thickness of 5 μm under different tube currents and models (a, b) nano-focus model (c, d) micro-focus model (e, f) high-power model |
![]() |