基于磁控溅射法显微CT W-Al透射靶材的制备及其性能研究*
马玉田,刘俊标(
),霍荣岭,韩立,牛耕
),霍荣岭,韩立,牛耕
RESEARCH ON THE PREPARATION AND PERFOR-MANCE OF TUNGSTEN-ALUMINUM TRANSMIS-SION TARGET FOR MICRO-COMPUTED TOMOGRAPHY BY MAGNETRONSPUTTERING
Yutian MA,Junbiao LIU(),Rongling HUO,Li HAN,Geng NIU
),Rongling HUO,Li HAN,Geng NIU
图3. 磁控溅射方法制备的靶面W薄膜和YXLON光机靶面W薄膜微观形貌的SEM像
Fig.3. Low (a, c) and high (b, d) magnified SEM images of tungsten films prepared by the magnetron sputtering method (a, b) and YXLON (c, d)
