基于磁控溅射法显微CT W-Al透射靶材的制备及其性能研究*
马玉田,刘俊标(
),霍荣岭,韩立,牛耕
),霍荣岭,韩立,牛耕
RESEARCH ON THE PREPARATION AND PERFOR-MANCE OF TUNGSTEN-ALUMINUM TRANSMIS-SION TARGET FOR MICRO-COMPUTED TOMOGRAPHY BY MAGNETRONSPUTTERING
Yutian MA,Junbiao LIU(),Rongling HUO,Li HAN,Geng NIU
),Rongling HUO,Li HAN,Geng NIU
图2. 最佳靶材厚度随电压的变化关系和70 kV时W靶面的X射线产额
Fig.2. Change of optimal target thickness with acceleration voltage (a) and X-ray yield of tungsten film at 70 kV (b)
