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Sn/Cu互连体系界面金属间化合物Cu6Sn5演化和生长动力学的相场法模拟*
柯常波, 周敏波, 张新平

PHASE FIELD SIMULATION ON MICROSTRUCTURE EVOLUTION AND GROWTH KINETICS OF Cu6Sn5 INTERMETALLIC COMPOUND DURING EARLY INTERFACIAL REACTION IN Sn/Cu SOLDERING SYSTEM
KE Changbo, ZHOU Minbo, ZHANG Xinping
表2 不同DGB下正常生长阶段IMC层厚度和晶粒横向粒径随时间变化的指数拟合结果
Table 2 Exponential fitting results of variations of IMC layer thickness and average width of Cu6Sn5 scallop-type grains with time during normal growth stage for different grain boundary diffusion coefficients
DGB IMC layer thickness Scallop average width
KT nT R2 KW nW R2
2.0×103Dη 35.44 0.35 0.998 23.16 0.32 0.997
2.0×102Dη 28.80 0.37 0.997 25.54 0.27 0.991
Dη 22.52 0.40 0.991 16.27 0.48 0.989