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Acta Metall Sin  2013, Vol. 49 Issue (6): 649-657    DOI: 10.3724/SP.J.1037.2012.00680
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CRYSTALLIZATION BEHAVIOR OF ANNEALED Zr55Cu30Al10Ni5 BULK METALLIC GLASS  DURING PULSED LASER REMELTING
YANG Gaolin, LIN Xin, HU Qiao, ZHANG Ying, WANG Zhitai, LI Peng, HUANG Weidong
State Key Laboratory of Solidification Processing, Northwestern Polytechnical University, Xi'an 710072
Cite this article: 

YANG Gaolin, LIN Xin, HU Qiao, ZHANG Ying, WANG Zhitai, LI Peng, HUANG Weidong. CRYSTALLIZATION BEHAVIOR OF ANNEALED Zr55Cu30Al10Ni5 BULK METALLIC GLASS  DURING PULSED LASER REMELTING. Acta Metall Sin, 2013, 49(6): 649-657.

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Abstract  

The crystallization behavior of annealed metallic glasses during pulsed laser remelting was investigated in this work. The as-casted Zr55Cu30Al10Ni5 bulk metallic glasses were annealed at 390, 430, 530, 792 and 902℃ separately. And then these annealed alloys were remelted by pulsed laser. The experiment results show that the alloys annealed at 390 and 430℃ were still metallic glasses, and their crystallization behavior during remelting is similar to the remelting of metallic glass without annealing treatment. The specimens annealed at 530, 792 and 902℃ were completely crystallized. After remelting, the molten pools of these specimens were amorphous. For the specimens annealed at 530 and 792℃, there was no obvious epitaxial growth at the bottom of molten pools. For the specimens annealed at 902℃, there was little primary phase epitaxial growth at bottom of molten pool after one time laser remelting while without epitaxial growth after 11 times laser remelting. The epitaxial growth was caused by the area reserved the composition distribution of CuZr2 primary phase during laser remelting. So it is hard to obtain epitaxial growth during laser remelting for Zr55Cu30Al10Ni5m bulk metallic glasses even it has a crystallization substrate because of the slow diffusion. So it is easy to keep molten pool as amorphous state during laser treating Zr55Cu30Al10Ni5 bulk metallic glasses.

Key words:  Zr55Cu30Al10Ni5 bulk metallic glass      annealing, laser      epitaxial growth     
Received:  13 November 2012     

URL: 

https://www.ams.org.cn/EN/10.3724/SP.J.1037.2012.00680     OR     https://www.ams.org.cn/EN/Y2013/V49/I6/649

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