轴对称磁场对电弧离子镀弧斑运动的影响

doi:10.3724/SP.J.1037.2009.00556

金属学报

2010, Vol. 46

Issue (3): 372-379 DOI: 10.3724/SP.J.1037.2009.00556

论文

本期目录 | 过刊浏览

轴对称磁场对电弧离子镀弧斑运动的影响

郎文昌¹⁾; 肖金泉^1;2); 宫骏¹⁾; 孙超¹⁾; 黄荣芳²⁾; 闻立时¹⁾

1) 中国科学院金属研究所材料表面工程研究部; 沈阳 110016
2) 湖南远科航表面工程有限公司; 长沙 410013

INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING

LANG Wenchang¹⁾; XIAO Jinquan^1;2); GONG Jun¹⁾; SUN Chao¹⁾; HUNG Rongfang²⁾; WEN Lishi¹⁾

1) Division of Surface Engineering of Materials; Institute of Metal Research; Chinese Academy of Sciences; Shenyang 110016\par
2) Hunan YKH Surface Engineering Co.; Ltd; Changsha 410013

引用本文:

郎文昌肖金泉宫骏孙超黄荣芳闻立时. 轴对称磁场对电弧离子镀弧斑运动的影响[J]. 金属学报, 2010, 46(3): 372-379.
. INFLUENCE OF AXISYMMETRIC MAGNETIC FIELD ON CATHODE SPOTS MOVEMENT IN ARC ION PLATING[J]. Acta Metall Sin, 2010, 46(3): 372-379.

全文: PDF(1212 KB)

摘要:

研究了轴对称磁场对电弧离子镀弧斑运动的影响规律, 利用有限元分析软件FEMM对轴对称磁场的分布进行了模拟, 采用SHT-V型磁场测试仪测试了磁场强度, 分析了靶面不同磁场分量的分布规律. 从电弧斑点放电的物理机制出发, 探讨了不同磁场分量和轴对称磁场对电弧离子镀弧斑运动的影响机制. 结果表明, 轴对称磁场通过影响空间正电荷密度n⁺的分布而作用于弧斑运动; 随着轴对称磁场横向分量的增加, 电弧斑点由随机运动逐渐转变为向靶面边缘扩展的旋转运动, 弧斑运动速度加快, 电弧电压升高, 电流下降; 当横向分量增加到临界强度(B_T≈30 Gs)时,弧斑在靶材边缘稳定的快速旋转运动并在靶沿处上下抖动, 弧斑分裂, 靶面中心处每隔0.5 s左右出现多个细的圆斑线, 然后很快向外扩展消失; 靶材边缘出现明显的刻蚀轨道.

关键词 ：电弧离子镀, 轴对称磁场, 有限元分析, 弧斑运动

Abstract：

Arc ion plating (AIP) has been widely utilized in the deposition of various kinds of thin solid films due to the excellent characteristics of the arc plasma produced from an active cathode spot that emits ions of cathode material, as well as electrons. In AIP process, the cathode spot is usually steered by an external magnetic field. Cathode spot motion is the key factor because it affects the physical characteristics of the vacuum arc plasma, the utilization of the cathode material, the emission of macroparticles (MPs) and the quality of subsequent films containing these MPs. Therefore, cathode spot dynamics should be understood practically under a compound external magnetic field, such as in axisymmetric magnetic field (AMF), for industrial applications. An AMF produced by using an adjustable electromagnetic coil associated with a concentric magnetic flux guider was applied to the cathode surface to investigate the influence of the AMF on the arc cathode spot motion. The distribution of the magnetic field was simulated by the finite element method (FEM) software. The magnetic field intensity was measured by an SHT-V magnetometer and the distributions of magnetic field with different intensities were analyzed. Based on the results of FEM simulation and the physical mechanism of the arc cathode spot discharge, the effects of magnetic-field components and AMF on the cathode spot movement were discussed. The results showed that increasing the AMF intensity can strongly influence cathode spot movement. In the case of a weak AMF, the cathode spot moves randomly on the cathode surface. With increasing AMF, there is an increasing tendency for the cathode spot to rotate and drift toward the cathode target edge. The increase in the transverse magnetic field (TMF) intensity, B_T, can accelerate the rotational velocity of the cathode spot, increase the arc voltage and decrease the arc current. With a relatively strong AMF (B_T≈30 Gs), the cathode spot rotates near the edge of the cathode surface and is confined to a circular trajectory. A new arc cathode spot is ignited, splits, and is extinguished repeatedly on the cathode surface, which can be observed at intervals of about 0.5 s, while there is an obvious erosion track left at the bottom of the cathode edge.

Key words： arc ion plating axisymmetric magnetic field finite element analysis cathode spot movement

收稿日期: 2009-08-25

基金资助:

国家高技术研究发展计划资助项目2006AA03Z521

作者简介: 郎文昌, 男, 1982年生, 博士生

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https://www.ams.org.cn/CN/10.3724/SP.J.1037.2009.00556 或 https://www.ams.org.cn/CN/Y2010/V46/I3/372

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