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射频反应溅射制备MgO二次电子发射薄膜* |
王彬1,2,熊良银1,2,刘实1,2() |
1 中国科学院金属研究所, 沈阳 110016 2 中国科学院金属研究所核用材料与安全评价重点实验室, 沈阳 110016 |
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MgO SECONDARY ELECTRON EMISSION FILM PREPARED BY RADIO-FREQUENCY REACTIVE SPUTERRING |
Bin WANG1,2,Liangyin XIONG1,2,Shi LIU1,2() |
1 Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China 2 Key Laboratory of Nuclear Materials and Safety Assessment, Institute of Metal Research, Chinese Academy of Sciences, Shenyang 110016, China |
引用本文:
王彬,熊良银,刘实. 射频反应溅射制备MgO二次电子发射薄膜*[J]. 金属学报, 2016, 52(1): 10-16.
Bin WANG,
Liangyin XIONG,
Shi LIU.
MgO SECONDARY ELECTRON EMISSION FILM PREPARED BY RADIO-FREQUENCY REACTIVE SPUTERRING[J]. Acta Metall Sin, 2016, 52(1): 10-16.
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