图7. 单道熔覆Zr55非晶合金时的温度场模拟结果

Fig.7. Simulation results of the thermal field in the deposit during one layer single-track deposition(a, b) temperature distributions for 0.06 s after irradiation with 7.0 J/mm (Points A and B are located at the surface of the molten pool zone, points C and D are located at the top of HAZ, points E and F are at the boundary between the HAZ and already-deposited amorphous zone; T_m is the melting temperature, T_x is the onset crystallization temperature, T_g is the glass transition temperature)(c) continuous heating transformation (CHT)curves for Zr55 bulk metallic glass (BMG) according to thermal cycles at the boundaries (Curves 1~3 denote the temperature profiles during deposited the coarser powder with laser heat input of 7.0, 10.8 and 15.7 J/mm, curves 4~6 denote the temperature profiles during deposited the finer powder with different heat inputs)