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用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率 |
印仁和;曹为民;李亚君;李卓棠;荣国斌 |
上海大学;上海;201800;上海大学;上海;201800;上海大学;上海;201800;上海大学;上海;201800;华东理工大学;上海;200237 |
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THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS |
YIN Renhe; CAO Weimin; LI Yajun(The Electrochemical Research Center; ShanghaiUniversity; Shanghai 201800) LI Zhuotang (Deportment of Materials; Shanghai University)) RONG Guobin (East China University of Science and Technology) |
引用本文:
印仁和;曹为民;李亚君;李卓棠;荣国斌. 用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率[J]. 金属学报, 1997, 33(6): 667-672.
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THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS[J]. Acta Metall Sin, 1997, 33(6): 667-672.
1印仁和,谷口成史,林安德.中国科学技术大学学报,1994:24:252 2 Natishan P M,Cafferty E M,Hubler G K.J Electro-chem Soc、1988;135:321 3杉本克久,林安德,相马才晃,原信义.气相铁钢表面高机能化.东京:日本铁钢协会1995:45 4Keen J M Electronics Lett, 1971; 7: 433? |
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