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金属学报  1997, Vol. 33 Issue (6): 667-672    
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用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率
印仁和;曹为民;李亚君;李卓棠;荣国斌
上海大学;上海;201800;上海大学;上海;201800;上海大学;上海;201800;上海大学;上海;201800;华东理工大学;上海;200237
THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS
YIN Renhe; CAO Weimin; LI Yajun(The Electrochemical Research Center; ShanghaiUniversity; Shanghai 201800) LI Zhuotang (Deportment of Materials; Shanghai University)) RONG Guobin (East China University of Science and Technology)
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摘要 用临界钝化电流(CriticalPassivationCurrentDensity.CPCD)法和液晶法,研究了不锈钢上Ta2O5,ZrO2的高频溅射膜的缺陷率建立了CPCD法中与薄膜有关的电流密度If与膜厚d之间的关系式:If=k(1-θ)d.利用液晶的动态散射模型(DynamicScatteringMode,DSM),建立了动态无损伤检测膜缺陷率的新方法,并证明了这两种方法的检测结果有良好的直线关系。
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印仁和
曹为民
李亚君
李卓棠
荣国斌
关键词:  临界钝化电流密度法  动态散射模型  液晶  氧化物薄膜  缺陷率    
Abstract: The defects in Ta2O5 and ZrO2 films prepared by RF sputtering on SUS304stainless steel were studied by CPCD (critical passivation current density) and liquid crystalmethods. In CPCD method a relation between current density if and film thickness wasgiven: If= K(1-0)d. Using DSM (dynamic scattering mode) of liquid crystal, a new methodabout nondestructive testing of film defects was reported. The results of the two methodsshowed a good linear relation.
Key words:  CPCD method    DSM    liquid crystal    oxide film    defect
收稿日期:  1997-06-18      修回日期:  1997-06-18           出版日期:  1997-06-18      发布日期:  1997-06-18      期的出版日期:  1997-06-18
基金资助: 国家自然科学基金!59471060
引用本文:    
印仁和;曹为民;李亚君;李卓棠;荣国斌. 用临界钝化电流法和液晶法检测金属氧化物膜的缺陷率[J]. 金属学报, 1997, 33(6): 667-672.
YIN Renhe; CAO Weimin; LI Yajun(The Electrochemical Research Center; ShanghaiUniversity; Shanghai 201800) LI Zhuotang (Deportment of Materials; Shanghai University)) RONG Guobin (East China University of Science and Technology). THE INSPECTION OF DEFECTS IN METAL OXIDE FILMS BY CPCD AND LIQUID CRYSTAL METHODS. Acta Metall Sin, 1997, 33(6): 667-672.
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1印仁和,谷口成史,林安德.中国科学技术大学学报,1994:24:252
2 Natishan P M,Cafferty E M,Hubler G K.J Electro-chem Soc、1988;135:321
3杉本克久,林安德,相马才晃,原信义.气相铁钢表面高机能化.东京:日本铁钢协会1995:45
4Keen J M Electronics Lett, 1971; 7: 433?
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