金属学报  1993, Vol. 29 Issue (1): 87-92

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等离子体化学气相沉积Ti-N-C膜的研究

赵程;彭红瑞;李世直

青岛化工学院;青岛化工学院;青岛化工学院

PLASMA CHEMICAL VAPOUR DEPOSITION OF Ti-N-C FILMS

ZHAO Cheng;PENG Hongrui;LI Shizhi Qingdao Institute of Chemical Technology

赵程;彭红瑞;李世直. 等离子体化学气相沉积Ti-N-C膜的研究[J]. 金属学报, 1993, 29(1): 87-92.
, , . PLASMA CHEMICAL VAPOUR DEPOSITION OF Ti-N-C FILMS[J]. Acta Metall Sin, 1993, 29(1): 87-92.

摘要 参考文献 相关文章 Metrics 全文: PDF(962 KB)   摘要: 用XPS,AES,XRD,SEM及显微硬度计分析和测试了不同成分的等离子体化学气相沉积(PCVD)Ti—N—C膜,并与PCVD一TiN膜比较。认为:Ti—N—C膜优异的耐磨性可归因于高显微硬度及致密的结构。AES及XPS分析结果表明,Ti—N—C与TiN膜表面吸附的氧原子价态不同,其决定因素是膜晶格中是否有足够的碳原子存在。氧吸附态的不同可能导致不同的磨损失效方式。 关键词 ： 等离子体化学气相沉积(PCVD),  Ti-N-C膜,  TiN膜     Abstract：Plasma chemical vapour deposited (PCVD) Ti-N-C films with different Cand N contents were examined, in comparison with C-free ones, by XPS, AES, XRD, SEMand microhardness testing. The PCVD Ti-N-C film may attribute its superior wear resist-ance to its high microhardness and dense structure. The variety of valence state of oxygenatoms adsorbed on Ti-N-C or TiN film surface was detected by AES and XPS analyses.Whether or not sufficient C atoms, existing in the lattice of the films seems to be decisive. Dif-ferent states of oxygen adsorbed may cause different modes of abrasive damage of film. Key words： plasma chemical vapour deposition    Ti-N-C film    TiN film 收稿日期: 1993-01-18      基金资助:国家自然科学基金 服务 把本文推荐给朋友 加入引用管理器 E-mail Alert RSS 作者相关文章 赵程 彭红瑞 李世直 44.8K 链接本文: https://www.ams.org.cn/CN/      或      https://www.ams.org.cn/CN/Y1993/V29/I1/87 1 李世直,徐翔.金属学报,1988;24:B163 2 Li Shizhi, Huang Wu, Yang Hongshun, Wang Zhongshu. Plasma Chem Plasma Process, 1984; 4: 148 3 Jang D H, Chun J S, Kim J G. Thin Solid Films, 1989; 169: 57 4 Li Shizhi, Zhao Cheng, Xu Xiang, Shi Yulong, Yang Hongshun, Xie Yan, Huang Wu. Surf Coat Technol. 1990; 43/44: 1007 5 Sundgren J-E, Hentzell H T G. J Vac Sci Technol, 1986; 5: 2259 6 韩效溪,丁正明,林行方.上海交通大学学报,1988;22(1) :77 7 Hofmann S. J Vac Sci Technol, 1986; 6: 2789 8 Briggs D, Seah M P. Practical Surface Analysis by Auger and X-ray Photoelectron Spectroscopy. New York: Wiley, 1983 9 Sadshiro T, Y amaya S, Shibuki K, Ujiie N. Wiar, 1978; 48: 291 [1] 覃明; 嵇宁 . TiN 附着膜的应力-应变关系[J]. 金属学报, 2003, 39(7): 721-724 . [2] 谢飞; 何家文 . 高速钢W18Cr4V离子渗氮层组织对TiN膜与基体结合强度的影响[J]. 金属学报, 2000, 36(10): 1099-1103 . [3] 于力;刘技文;赵杰;戴少侠;金柱京;王慧君. 基材温度对离子镀TiN膜性能的影响[J]. 金属学报, 1996, 32(12): 1270-1274. [4] 刘捍卫;陈元儒;张绪寿. 离子束辅助沉积TiN膜的摩擦学特性[J]. 金属学报, 1994, 30(19): 323-326. [5] 李世直;徐翔. 等离子体化学气相沉积TiN膜的研究[J]. 金属学报, 1988, 24(3): 229-235. Viewed Full text Abstract Cited   Shared      Discussed