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磁控溅射Al-Mg-B薄膜成分优化 |
曲文超1, 2), 吴爱民1, 2), 吴占玲1, 3), 白亦真1, 3), 姜辛1, 3, 4) |
1) 大连理工大学机械工程与材料能源学部 材料科学与工程学院, 大连 116024
2) 大连理工大学三束材料改性教育部重点实验室, 大连 116024
3) 大连理工大学物理与光电工程学院, 大连 116024
4) Institute of Materials Engineering, University of Siegen, Siegen 57076 |
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COMPOSITION OPTIMIZATION OF Al-Mg-B THIN FILM PROPERTIES PREPERAED BY MAGNETRON SPUTTERING |
QU Wenchao1, 2), WU Aimin1, 2), WU Zhanling1, 3), BAI Yizhen1, 3), JIANG Xin1, 3, 4) |
1) School of Materials Science and Engineering, Faculty of Mechanical Engineering and Materials Energy, Dalian University of Technology, Dalian 116024
2) Key Laboratory of Materials Modification by Laser, Ion and Electron Beams, Ministry of Education, Dalian University of Technology, Dalian 116024
3) School of Physics and Optoelectronic Technology, Dalian University of Technology, Dalian 116024
4) Institute of Materials Engineering, University of Siegen, Siegen 57076 |
引用本文:
曲文超 吴爱民 吴占玲 白亦真 姜辛. 磁控溅射Al-Mg-B薄膜成分优化[J]. 金属学报, 2011, 47(5): 628-633.
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COMPOSITION OPTIMIZATION OF Al-Mg-B THIN FILM PROPERTIES PREPERAED BY MAGNETRON SPUTTERING[J]. Acta Metall Sin, 2011, 47(5): 628-633.
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